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Tin deposition on ruthenium and its influence on blistering in multi-layer mirrors
An atomistic description of tin deposition on ruthenium and its effect on blistering damage is of great interest in extreme ultraviolet (EUV) lithography. In EUV machines, tin debris from the EUV-emitting tin plasma may be deposited on the mirrors in the optical path. Tin facilitates the formation o...
Autores principales: | Onwudinanti, Chidozie, Brocks, Geert, Koelman, Vianney, Morgan, Thomas, Tao, Shuxia |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8323739/ https://www.ncbi.nlm.nih.gov/pubmed/34114582 http://dx.doi.org/10.1039/d1cp01082d |
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