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3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
Electron beam lithography (EBL) is renowned to provide fabrication resolution in the deep nanometer scale. One major limitation of current EBL techniques is their incapability of arbitrary 3d nanofabrication. Resolution, structure integrity and functionalization are among the most important factors....
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8390743/ https://www.ncbi.nlm.nih.gov/pubmed/34446721 http://dx.doi.org/10.1038/s41467-021-25470-1 |