Femtosecond Laser-Induced Crystallization of Amorphous Silicon Thin Films under a Thin Molybdenum Layer

[Image: see text] A new process to crystallize amorphous silicon without melting and the generation of excessive heating of nearby components is presented. We propose the addition of a molybdenum layer to improve the quality of the laser-induced crystallization over that achieved by direct irradiati...

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Detalles Bibliográficos
Autores principales: Farid, Nazar, Brunton, Adam, Rumsby, Phil, Monaghan, Scott, Duffy, Ray, Hurley, Paul, Wang, Mingqing, Choy, Kwang-Leong, O’Connor, Gerard M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8397252/
https://www.ncbi.nlm.nih.gov/pubmed/34319701
http://dx.doi.org/10.1021/acsami.1c07083

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8397252/
https://www.ncbi.nlm.nih.gov/pubmed/34319701
http://dx.doi.org/10.1021/acsami.1c07083

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