Cargando…
Femtosecond Laser-Induced Crystallization of Amorphous Silicon Thin Films under a Thin Molybdenum Layer
[Image: see text] A new process to crystallize amorphous silicon without melting and the generation of excessive heating of nearby components is presented. We propose the addition of a molybdenum layer to improve the quality of the laser-induced crystallization over that achieved by direct irradiati...
Autores principales: | Farid, Nazar, Brunton, Adam, Rumsby, Phil, Monaghan, Scott, Duffy, Ray, Hurley, Paul, Wang, Mingqing, Choy, Kwang-Leong, O’Connor, Gerard M. |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American
Chemical Society
2021
|
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8397252/ https://www.ncbi.nlm.nih.gov/pubmed/34319701 http://dx.doi.org/10.1021/acsami.1c07083 |
Ejemplares similares
-
Femtosecond Laser Assisted Crystallization of Gold Thin Films
por: Sharif, Ayesha, et al.
Publicado: (2021) -
Thermal and Mechanical Properties of Amorphous Silicon Carbide Thin Films Using the Femtosecond Pump-Probe Technique
por: Kim, Yun Young
Publicado: (2022) -
Fabrication of Thin-Film LAPS with Amorphous Silicon
por: Yoshinobu, Tatsuo, et al.
Publicado: (2004) -
Electrodeposition of amorphous molybdenum sulfide thin film for electrochemical hydrogen evolution reaction
por: Zhang, Lina, et al.
Publicado: (2019) -
Femtosecond pulsed laser deposition of silicon thin films
por: Murray, Matthew, et al.
Publicado: (2013)