Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data

In this study, we submit a complex set of in-situ data collected by optical emission spectroscopy (OES) during the process of aluminum nitride (AlN) thin film. Changing the sputtering power and nitrogen(N(2)) flow rate, AlN film was deposited on Si substrate using a superior sputtering with a pulsed...

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Detalles Bibliográficos
Autores principales: Yang, Yu-Pu, Lu, Te-Yun, Lo, Hsiao-Han, Chen, Wei-Lun, Wang, Peter J., Lai, Walter, Fuh, Yiin-Kuen, Li, Tomi T.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8400567/
https://www.ncbi.nlm.nih.gov/pubmed/34442969
http://dx.doi.org/10.3390/ma14164445

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8400567/
https://www.ncbi.nlm.nih.gov/pubmed/34442969
http://dx.doi.org/10.3390/ma14164445

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