Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication

This paper reviews the recent advances in reaction-ion etching (RIE) for application in high-aspect-ratio microfabrication. High-aspect-ratio etching of materials used in micro- and nanofabrication has become a very important enabling technology particularly for bulk micromachining applications, but...

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Detalles Bibliográficos
Autor principal: Huff, Michael
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8400956/
https://www.ncbi.nlm.nih.gov/pubmed/34442613
http://dx.doi.org/10.3390/mi12080991

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8400956/
https://www.ncbi.nlm.nih.gov/pubmed/34442613
http://dx.doi.org/10.3390/mi12080991

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