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Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
This paper reviews the recent advances in reaction-ion etching (RIE) for application in high-aspect-ratio microfabrication. High-aspect-ratio etching of materials used in micro- and nanofabrication has become a very important enabling technology particularly for bulk micromachining applications, but...
Autor principal: | Huff, Michael |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8400956/ https://www.ncbi.nlm.nih.gov/pubmed/34442613 http://dx.doi.org/10.3390/mi12080991 |
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