Towards Scalable Large-Area Pulsed Laser Deposition

One of the significant limitations of the pulsed laser deposition method in the mass-production-technologies of micro- and nanoelectronic and molecular device electronic fabrication is the issue of ensuring deposition of films with uniform thickness on substrates with large diameter (more than 100 m...

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Detalles Bibliográficos
Autores principales: Vakulov, Zakhar, Khakhulin, Daniil, Zamburg, Evgeny, Mikhaylichenko, Alexander, Smirnov, Vladimir A., Tominov, Roman, Klimin, Viktor S., Ageev, Oleg A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8432691/
https://www.ncbi.nlm.nih.gov/pubmed/34500943
http://dx.doi.org/10.3390/ma14174854

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8432691/
https://www.ncbi.nlm.nih.gov/pubmed/34500943
http://dx.doi.org/10.3390/ma14174854

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