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Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material
Functional devices that use vertical van der Waals (vdWs) heterostructure material can effectively combine the properties of single component materials, and the strong interlayer coupling effect can change their electronic and optical properties. According to our research, WS(2)/h-BN vertical vdWs h...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8464811/ https://www.ncbi.nlm.nih.gov/pubmed/34577650 http://dx.doi.org/10.3390/mi12091006 |
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author | Han, Tao Liu, Hongxia Chen, Shupeng Wang, Shulong Yang, Kun |
author_facet | Han, Tao Liu, Hongxia Chen, Shupeng Wang, Shulong Yang, Kun |
author_sort | Han, Tao |
collection | PubMed |
description | Functional devices that use vertical van der Waals (vdWs) heterostructure material can effectively combine the properties of single component materials, and the strong interlayer coupling effect can change their electronic and optical properties. According to our research, WS(2)/h-BN vertical vdWs heterostructure material can be synthesized by chemical vapor deposition (CVD) and wet transfer methods. Monolayer WS(2) material and WS(2)/h-BN vertical vdWs heterostructure material can be tested and characterized using XPS, SEM, EDS, AFM and Raman spectroscopy, which can prove the existence of corresponding materials. When the thickness of the material decreases, the Coulomb scattering amongst two-dimensional (2D) layered materials increases. This is because both the shielding effect and the distance between the channel and the interface layer decrease. FET devices are then fabricated on WS(2)/h-BN vdWs heterostructure material by the electron beam lithography and evaporation processes. The effects of vdWs epitaxy on electrical transmission when WS(2)/h-BN vdWs heterostructure material is formed are explored. Finally, the related electrical performance of FET devices is tested and analyzed. Our experimental research provides guidance for the use of electronic devices with vdWs heterostructure material. |
format | Online Article Text |
id | pubmed-8464811 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-84648112021-09-27 Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material Han, Tao Liu, Hongxia Chen, Shupeng Wang, Shulong Yang, Kun Micromachines (Basel) Article Functional devices that use vertical van der Waals (vdWs) heterostructure material can effectively combine the properties of single component materials, and the strong interlayer coupling effect can change their electronic and optical properties. According to our research, WS(2)/h-BN vertical vdWs heterostructure material can be synthesized by chemical vapor deposition (CVD) and wet transfer methods. Monolayer WS(2) material and WS(2)/h-BN vertical vdWs heterostructure material can be tested and characterized using XPS, SEM, EDS, AFM and Raman spectroscopy, which can prove the existence of corresponding materials. When the thickness of the material decreases, the Coulomb scattering amongst two-dimensional (2D) layered materials increases. This is because both the shielding effect and the distance between the channel and the interface layer decrease. FET devices are then fabricated on WS(2)/h-BN vdWs heterostructure material by the electron beam lithography and evaporation processes. The effects of vdWs epitaxy on electrical transmission when WS(2)/h-BN vdWs heterostructure material is formed are explored. Finally, the related electrical performance of FET devices is tested and analyzed. Our experimental research provides guidance for the use of electronic devices with vdWs heterostructure material. MDPI 2021-08-24 /pmc/articles/PMC8464811/ /pubmed/34577650 http://dx.doi.org/10.3390/mi12091006 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Han, Tao Liu, Hongxia Chen, Shupeng Wang, Shulong Yang, Kun Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material |
title | Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material |
title_full | Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material |
title_fullStr | Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material |
title_full_unstemmed | Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material |
title_short | Preparation and Research of Monolayer WS(2) FETs Encapsulated by h-BN Material |
title_sort | preparation and research of monolayer ws(2) fets encapsulated by h-bn material |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8464811/ https://www.ncbi.nlm.nih.gov/pubmed/34577650 http://dx.doi.org/10.3390/mi12091006 |
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