Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic deep reactive-ion etching techniques. The desi...

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Detalles Bibliográficos
Autores principales: Baracu, Angela Mihaela, Avram, Marius Andrei, Breazu, Carmen, Bunea, Mihaela-Cristina, Socol, Marcela, Stanculescu, Anca, Matei, Elena, Thrane, Paul Conrad Vaagen, Dirdal, Christopher Andrew, Dinescu, Adrian, Rasoga, Oana
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8467467/
https://www.ncbi.nlm.nih.gov/pubmed/34578646
http://dx.doi.org/10.3390/nano11092329

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8467467/
https://www.ncbi.nlm.nih.gov/pubmed/34578646
http://dx.doi.org/10.3390/nano11092329

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