Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor

The continuous development of ALD thin films demands ongoing improvements and changes toward fabricating materials with tailored properties that are suitable for different practical applications. Ozone has been recently established as a precursor, with distinct advantages over the alternative oxidiz...

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Detalles Bibliográficos
Autores principales: Seweryn, Aleksandra, Lawniczak-Jablonska, Krystyna, Kuzmiuk, Piotr, Gieraltowska, Sylwia, Godlewski, Marek, Mroczynski, Robert
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8470079/
https://www.ncbi.nlm.nih.gov/pubmed/34576619
http://dx.doi.org/10.3390/ma14185395

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8470079/
https://www.ncbi.nlm.nih.gov/pubmed/34576619
http://dx.doi.org/10.3390/ma14185395

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