Composite Memristors by Nanoscale Modification of Hf/Ta Anodic Oxides

[Image: see text] Composite memristors based on anodic oxidation of Hf superimposed on Ta thin films are studied. A layered structure is obtained by successive sputtering of Ta and Hf thin films. The deposition geometry ensured components’ thickness gradient profiles (wedges) aligned in opposite dir...

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Detalles Bibliográficos
Autores principales: Zrinski, Ivana, Minenkov, Alexey, Mardare, Cezarina Cela, Hassel, Achim Walter, Mardare, Andrei Ionut
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8474145/
https://www.ncbi.nlm.nih.gov/pubmed/34499511
http://dx.doi.org/10.1021/acs.jpclett.1c02346

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8474145/
https://www.ncbi.nlm.nih.gov/pubmed/34499511
http://dx.doi.org/10.1021/acs.jpclett.1c02346

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