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HfS(2) thin films deposited at room temperature by an emerging technique, solution atomic layer deposition
As a member of the two-dimensional metal dichalcogenide family, HfS(2) has emerged as a promising material for various optoelectronic applications. Atomic layer deposition is widely used in microelectronics manufacturing with unique properties in terms of accurate thickness control and high conforma...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8477444/ https://www.ncbi.nlm.nih.gov/pubmed/34581330 http://dx.doi.org/10.1039/d1dt01232k |