Cargando…

HfS(2) thin films deposited at room temperature by an emerging technique, solution atomic layer deposition

As a member of the two-dimensional metal dichalcogenide family, HfS(2) has emerged as a promising material for various optoelectronic applications. Atomic layer deposition is widely used in microelectronics manufacturing with unique properties in terms of accurate thickness control and high conforma...

Descripción completa

Detalles Bibliográficos
Autores principales:	Cao, Yuanyuan, Zhu, Sha, Bachmann, Julien
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	The Royal Society of Chemistry 2021
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8477444/ https://www.ncbi.nlm.nih.gov/pubmed/34581330 http://dx.doi.org/10.1039/d1dt01232k

Ejemplares similares

Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films
por: Kundrata, Ivan, et al.
Publicado: (2019)

Room-temperature bonding of Al(2)O(3) thin films deposited using atomic layer deposition
por: Takakura, Ryo, et al.
Publicado: (2023)

Few-layer HfS(2) transistors
por: Kanazawa, Toru, et al.
Publicado: (2016)

Solution Atomic Layer Deposition of Smooth, Continuous, Crystalline Metal–Organic Framework Thin Films
por: Barr, Maïssa K. S., et al.
Publicado: (2022)

Structural, Optical and Electrical Properties of HfO(2) Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition
por: Kim, Kyoung-Mun, et al.
Publicado: (2020)

Surface Passivation of Silicon Using HfO(2) Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
por: Zhang, Xiao-Ying, et al.
Publicado: (2017)

SiO(2) thin film growth through a pure atomic layer deposition technique at room temperature
por: Arl, D., et al.
Publicado: (2020)

Reliability enhancement in thin film transistors using Hf and Al co-incorporated ZnO active channels deposited by atomic-layer-deposition
por: Na, So-Yeong, et al.
Publicado: (2018)

Nano-oxide thin films deposited via atomic layer deposition on microchannel plates
por: Yan, Baojun, et al.
Publicado: (2015)

Uniformity of HfO(2) Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
por: Choi, Boyun, et al.
Publicado: (2022)

Compact Ga(2)O(3) Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature
por: Yang, Yue, et al.
Publicado: (2022)

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016)

Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
por: Ma, Qian, et al.
Publicado: (2018)

Yttrium Doping Effects on Ferroelectricity and Electric Properties of As-Deposited Hf(1−x)Zr(x)O(2) Thin Films via Atomic Layer Deposition
por: Oh, Youkyoung, et al.
Publicado: (2023)

Atomic layer deposition in energy conversion applications
por: Bachmann, Julien
Publicado: (2017)

Atomic Layer Deposition of Photoconductive Cu(2)O Thin Films
por: Iivonen, Tomi, et al.
Publicado: (2019)

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films
por: Madadi, Milad, et al.
Publicado: (2021)

Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone
por: Zou, Yiming, et al.
Publicado: (2021)

Atomic Layer Deposition of HfO(2) Films Using TDMAH and Water or Ammonia Water
por: Gieraltowska, Sylwia, et al.
Publicado: (2023)

Noble metal alloy thin films by atomic layer deposition and rapid Joule heating
por: Guo, Yuanyuan, et al.
Publicado: (2022)

Temperature-Dependent Absorption of Ternary HfS(2−x)Se(x) 2D Layered Semiconductors
por: Lin, Der-Yuh, et al.
Publicado: (2022)

Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film
por: Tamm, Aile, et al.
Publicado: (2021)

Atomic Layer Deposition of Alumina-Coated Thin-Film Cathodes for Lithium Microbatteries
por: O’Donoghue, Aaron, et al.
Publicado: (2023)

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition
por: Wang, Zi-Yi, et al.
Publicado: (2015)

The Effect of Film Thickness on the Gas Sensing Properties of Ultra-Thin TiO(2) Films Deposited by Atomic Layer Deposition
por: Wilson, Rachel L., et al.
Publicado: (2018)

The growth mechanism and intriguing optical and electronic properties of few-layered HfS(2)
por: Singh, Jitendra, et al.
Publicado: (2022)

Atomic layer deposition for fabrication of HfO(2)/Al(2)O(3) thin films with high laser-induced damage thresholds
por: Wei, Yaowei, et al.
Publicado: (2015)

Bi-layer Channel AZO/ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Technique
por: Li, Huijin, et al.
Publicado: (2017)

Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films
por: Fritze, Stefan, et al.
Publicado: (2019)

Temperature- and Frequency-Dependent Ferroelectric Characteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO(2) Films
por: Jang, Chan-Hee, et al.
Publicado: (2022)

The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin-Film Transistors Deposited via Atomic Layer Deposition
por: Ding, Xingwei, et al.
Publicado: (2017)

The Effects of Zr Doping on the Optical, Electrical and Microstructural Properties of Thin ZnO Films Deposited by Atomic Layer Deposition
por: Herodotou, Stephania, et al.
Publicado: (2015)

Effect of Process Temperature on Density and Electrical Characteristics of Hf(0.5)Zr(0.5)O(2) Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
por: Kim, Hak-Gyeong, et al.
Publicado: (2022)

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
por: Tamm, Aile, et al.
Publicado: (2017)

Thin-Film Engineering of Mechanical Fragmentation Properties of Atomic-Layer-Deposited Metal Oxides
por: Ruoho, Mikko, et al.
Publicado: (2020)

Cohesive strength of nanocrystalline ZnO:Ga thin films deposited at room temperature
por: Samantilleke, Anura Priyajith, et al.
Publicado: (2011)

Characterization of Al Incorporation into HfO(2) Dielectric by Atomic Layer Deposition
por: Rahman, Md. Mamunur, et al.
Publicado: (2019)

Preparation of Remote Plasma Atomic Layer-Deposited HfO(2) Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices
por: Yoo, Jae-Hoon, et al.
Publicado: (2023)

Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures
por: Ren, Fang-Bin, et al.
Publicado: (2022)

Erratum to: The Influence of Hafnium Doping on Density-of-States in Zinc Oxide Thin-Film Fransistors Deposited Via Atomic Layer Deposition
por: Ding, Xingwei, et al.
Publicado: (2017)

Cannot write session to /tmp/vufind_sessions/sess_a81g7u0ngp3bp39ct89pk5ip74