The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO(2) Layers Produced by Means of the E-BEAM Technique

Titanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, R...

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Detalles Bibliográficos
Autores principales: Jurek, Katarzyna, Szczesny, Robert, Trzcinski, Marek, Ciesielski, Arkadiusz, Borysiuk, Jolanta, Skowronski, Lukasz
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8510399/
https://www.ncbi.nlm.nih.gov/pubmed/34640273
http://dx.doi.org/10.3390/ma14195863

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8510399/
https://www.ncbi.nlm.nih.gov/pubmed/34640273
http://dx.doi.org/10.3390/ma14195863

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