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The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO(2) Layers Produced by Means of the E-BEAM Technique
Titanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, R...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8510399/ https://www.ncbi.nlm.nih.gov/pubmed/34640273 http://dx.doi.org/10.3390/ma14195863 |