Covalent Patterning of 2D MoS(2)

The development of an efficient method to patterning 2D MoS(2) into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionali...

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Detalles Bibliográficos
Autores principales: Chen, Xin, Kohring, Malte, Assebban, M'hamed, Tywoniuk, Bartłomiej, Bartlam, Cian, Moses Badlyan, Narine, Maultzsch, Janina, Duesberg, Georg S., Weber, Heiko B., Knirsch, Kathrin C., Hirsch, Andreas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2021
Materias:
Communications
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8518675/
https://www.ncbi.nlm.nih.gov/pubmed/34357651
http://dx.doi.org/10.1002/chem.202102021

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8518675/
https://www.ncbi.nlm.nih.gov/pubmed/34357651
http://dx.doi.org/10.1002/chem.202102021

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