Exploiting rotational asymmetry for sub-50 nm mechanical nanocalligraphy

Nanofabrication has experienced extraordinary progress in the area of lithography-led processes over the last decades, although versatile and adaptable techniques addressing a wide spectrum of materials are still nascent. Scanning probe lithography (SPL) offers the capability to readily pattern sub-...

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Detalles Bibliográficos
Autores principales: Farmakidis, Nikolaos, Swett, Jacob L., Youngblood, Nathan, Li, Xuan, Evangeli, Charalambos, Aggarwal, Samarth, Mol, Jan A., Bhaskaran, Harish
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8528849/
https://www.ncbi.nlm.nih.gov/pubmed/34691759
http://dx.doi.org/10.1038/s41378-021-00300-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8528849/
https://www.ncbi.nlm.nih.gov/pubmed/34691759
http://dx.doi.org/10.1038/s41378-021-00300-y

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