Annealing Effect on the Characteristics of Co(40)Fe(40)W(10)B(10) Thin Films on Si(100) Substrate

This research explores the behavior of Co(40)Fe(40)W(10)B(10) when it is sputtered onto Si(100) substrates with a thickness (t(f)) ranging from 10 nm to 100 nm, and then altered by an annealing process at temperatures of 200 °C, 250 °C, 300 °C, and 350 °C, respectively. The crystal structure and gra...

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Detalles Bibliográficos
Autores principales: Liu, Wen-Jen, Chang, Yung-Huang, Chen, Yuan-Tsung, Chang, Chun-Yu, Lai, Jian-Xin, Lin, Shih-Hung, Wu, Te-Ho, Chi, Po-Wei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8538527/
https://www.ncbi.nlm.nih.gov/pubmed/34683609
http://dx.doi.org/10.3390/ma14206017

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8538527/
https://www.ncbi.nlm.nih.gov/pubmed/34683609
http://dx.doi.org/10.3390/ma14206017

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