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Annealing Effect on the Characteristics of Co(40)Fe(40)W(10)B(10) Thin Films on Si(100) Substrate
This research explores the behavior of Co(40)Fe(40)W(10)B(10) when it is sputtered onto Si(100) substrates with a thickness (t(f)) ranging from 10 nm to 100 nm, and then altered by an annealing process at temperatures of 200 °C, 250 °C, 300 °C, and 350 °C, respectively. The crystal structure and gra...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8538527/ https://www.ncbi.nlm.nih.gov/pubmed/34683609 http://dx.doi.org/10.3390/ma14206017 |