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Absolute characterization of high numerical aperture microscope objectives utilizing a dipole scatterer
Measuring the aberrations of optical systems is an essential step in the fabrication of high precision optical components. Such a characterization is usually based on comparing the device under investigation with a calibrated reference object. However, when working at the cutting-edge of technology,...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8563975/ https://www.ncbi.nlm.nih.gov/pubmed/34728608 http://dx.doi.org/10.1038/s41377-021-00663-x |