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Absolute characterization of high numerical aperture microscope objectives utilizing a dipole scatterer

Measuring the aberrations of optical systems is an essential step in the fabrication of high precision optical components. Such a characterization is usually based on comparing the device under investigation with a calibrated reference object. However, when working at the cutting-edge of technology,...

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Detalles Bibliográficos
Autores principales:	Eismann, Jörg S., Neugebauer, Martin, Mantel, Klaus, Banzer, Peter
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group UK 2021
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8563975/ https://www.ncbi.nlm.nih.gov/pubmed/34728608 http://dx.doi.org/10.1038/s41377-021-00663-x

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