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Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers

A memristor based on emerging resistive random-access memory (RRAM) is a promising candidate for use as a next-generation neuromorphic computing device which overcomes the von Neumann bottleneck. Meanwhile, due to their unique properties, including atomically thin layers and surface smoothness, two-...

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Autores principales: Jin, Soeun, Kwon, Jung-Dae, Kim, Yonghun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8584643/
https://www.ncbi.nlm.nih.gov/pubmed/34771802
http://dx.doi.org/10.3390/ma14216275
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author Jin, Soeun
Kwon, Jung-Dae
Kim, Yonghun
author_facet Jin, Soeun
Kwon, Jung-Dae
Kim, Yonghun
author_sort Jin, Soeun
collection PubMed
description A memristor based on emerging resistive random-access memory (RRAM) is a promising candidate for use as a next-generation neuromorphic computing device which overcomes the von Neumann bottleneck. Meanwhile, due to their unique properties, including atomically thin layers and surface smoothness, two-dimensional (2D) materials are being widely studied for implementation in the development of new information-processing electronic devices. However, inherent drawbacks concerning operational uniformities, such as device-to-device variability, device yield, and reliability, are huge challenges in the realization of concrete memristor hardware devices. In this study, we fabricated Ta(2)O(5)-based memristor devices, where a 2D-MoS(2) buffer layer was directly inserted between the Ta(2)O(5) switching layer and the Ag metal electrode to improve uniform switching characteristics in terms of switching voltage, the distribution of resistance states, endurance, and retention. A 2D-MoS(2) layered buffer film with a 5 nm thickness was directly grown on the Ta(2)O(5) switching layer by the atomic-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) method, which is highly uniform and provided a superior yield of 2D-MoS(2) film. It was observed that the switching operation was dramatically stabilized via the introduction of the 2D-MoS(2) buffer layer compared to a pristine device without the buffer layer. It was assumed that the difference in mobility and reduction rates between Ta(2)O(5) and MoS(2) caused the narrow localization of ion migration, inducing the formation of more stable conduction filament. In addition, an excellent yield of 98% was confirmed while showing cell-to-cell operation uniformity, and the extrinsic and intrinsic variabilities in operating the device were highly uniform. Thus, the introduction of a MoS(2) buffer layer could improve highly reliable memristor device switching operation.
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spelling pubmed-85846432021-11-12 Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers Jin, Soeun Kwon, Jung-Dae Kim, Yonghun Materials (Basel) Article A memristor based on emerging resistive random-access memory (RRAM) is a promising candidate for use as a next-generation neuromorphic computing device which overcomes the von Neumann bottleneck. Meanwhile, due to their unique properties, including atomically thin layers and surface smoothness, two-dimensional (2D) materials are being widely studied for implementation in the development of new information-processing electronic devices. However, inherent drawbacks concerning operational uniformities, such as device-to-device variability, device yield, and reliability, are huge challenges in the realization of concrete memristor hardware devices. In this study, we fabricated Ta(2)O(5)-based memristor devices, where a 2D-MoS(2) buffer layer was directly inserted between the Ta(2)O(5) switching layer and the Ag metal electrode to improve uniform switching characteristics in terms of switching voltage, the distribution of resistance states, endurance, and retention. A 2D-MoS(2) layered buffer film with a 5 nm thickness was directly grown on the Ta(2)O(5) switching layer by the atomic-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) method, which is highly uniform and provided a superior yield of 2D-MoS(2) film. It was observed that the switching operation was dramatically stabilized via the introduction of the 2D-MoS(2) buffer layer compared to a pristine device without the buffer layer. It was assumed that the difference in mobility and reduction rates between Ta(2)O(5) and MoS(2) caused the narrow localization of ion migration, inducing the formation of more stable conduction filament. In addition, an excellent yield of 98% was confirmed while showing cell-to-cell operation uniformity, and the extrinsic and intrinsic variabilities in operating the device were highly uniform. Thus, the introduction of a MoS(2) buffer layer could improve highly reliable memristor device switching operation. MDPI 2021-10-21 /pmc/articles/PMC8584643/ /pubmed/34771802 http://dx.doi.org/10.3390/ma14216275 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Jin, Soeun
Kwon, Jung-Dae
Kim, Yonghun
Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers
title Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers
title_full Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers
title_fullStr Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers
title_full_unstemmed Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers
title_short Statistical Analysis of Uniform Switching Characteristics of Ta(2)O(5)-Based Memristors by Embedding In-Situ Grown 2D-MoS(2) Buffer Layers
title_sort statistical analysis of uniform switching characteristics of ta(2)o(5)-based memristors by embedding in-situ grown 2d-mos(2) buffer layers
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8584643/
https://www.ncbi.nlm.nih.gov/pubmed/34771802
http://dx.doi.org/10.3390/ma14216275
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