Cargando…
Electric field-induced crystallization of ferroelectric hafnium zirconium oxide
Ferroelectricity in crystalline hafnium oxide thin films is strongly investigated for the application in non-volatile memories, sensors and other applications. Especially for back-end-of-line (BEoL) integration the decrease of crystallization temperature is of major importance. However, an alternati...
Autores principales: | Lederer, Maximilian, Abdulazhanov, Sukhrob, Olivo, Ricardo, Lehninger, David, Kämpfe, Thomas, Seidel, Konrad, Eng, Lukas M. |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2021
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8594776/ https://www.ncbi.nlm.nih.gov/pubmed/34782687 http://dx.doi.org/10.1038/s41598-021-01724-2 |
Ejemplares similares
-
THz Thin Film Varactor
Based on Integrated Ferroelectric
HfZrO(2)
por: Abdulazhanov, Sukhrob, et al.
Publicado: (2022) -
Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction
por: Lederer, Maximilian, et al.
Publicado: (2020) -
Ferroelectricity and Oxide Reliability of Stacked Hafnium–Zirconium Oxide Devices
por: Liao, Ruo-Yin, et al.
Publicado: (2023) -
Hafnium–zirconium oxide interface models with a semiconductor and metal for ferroelectric devices
por: Chae, Kisung, et al.
Publicado: (2021) -
A multi-timescale synaptic weight based on ferroelectric hafnium zirconium oxide
por: Halter, Mattia, et al.
Publicado: (2023)