Cargando…

Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs

In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step coverage, the...

Descripción completa

Detalles Bibliográficos
Autores principales:	Yeh, Yen-Wei, Lin, Su-Hui, Hsu, Tsung-Chi, Lai, Shouqiang, Lee, Po-Tsung, Lien, Shui-Yang, Wuu, Dong-Sing, Li, Guisen, Chen, Zhong, Wu, Tingzhu, Kuo, Hao-Chung
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Springer US 2021
Materias:	Nano Review
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8602599/ https://www.ncbi.nlm.nih.gov/pubmed/34792678 http://dx.doi.org/10.1186/s11671-021-03623-x

Ejemplares similares

Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs
por: Yeh, Yen-Wei, et al.
Publicado: (2022)

Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s
por: Shen, Chih-Chiang, et al.
Publicado: (2019)

Surface Passivation of Silicon Using HfO(2) Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
por: Zhang, Xiao-Ying, et al.
Publicado: (2017)

Enhanced Si Passivation and PERC Solar Cell Efficiency by Atomic Layer Deposited Aluminum Oxide with Two-step Post Annealing
por: Hsu, Chia-Hsun, et al.
Publicado: (2019)

Investigation on the passivated Si/Al(2)O(3) interface fabricated by non-vacuum spatial atomic layer deposition system
por: Lien, Shui-Yang, et al.
Publicado: (2015)

Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO(x) Films at Different Substrate Temperatures
por: Huang, Pao-Hsun, et al.
Publicado: (2022)

Atom-to-atom interactions for atomic layer deposition of trimethylaluminum on Ga-rich GaAs(001)-4 × 6 and As-rich GaAs(001)-2 × 4 surfaces: a synchrotron radiation photoemission study
por: Pi, Tun-Wen, et al.
Publicado: (2013)

Compact Ga(2)O(3) Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature
por: Yang, Yue, et al.
Publicado: (2022)

AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
por: Tzou, An-Jye, et al.
Publicado: (2017)

Nano-oxide thin films deposited via atomic layer deposition on microchannel plates
por: Yan, Baojun, et al.
Publicado: (2015)

Atomic Layer Deposition of Buffer Layers for the Growth of Vertically Aligned Carbon Nanotube Arrays
por: Li, Hao-Hao, et al.
Publicado: (2019)

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016)

Iridium wire grid polarizer fabricated using atomic layer deposition
por: Weber, Thomas, et al.
Publicado: (2011)

Atomic Layer Deposition of Pt Nanoparticles for Microengine with Promoted Catalytic Motion
por: Jiang, Chi, et al.
Publicado: (2016)

Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture
por: Jiang, Shicong, et al.
Publicado: (2022)

Density Functional Theory Study of Atomic Layer Deposition of Zinc Oxide on Graphene
por: Ali, Amgad Ahmed, et al.
Publicado: (2015)

Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
por: Ma, Qian, et al.
Publicado: (2018)

High-Sensitivity and Long-Life Microchannel Plate Processed by Atomic Layer Deposition
por: Cao, Weiwei, et al.
Publicado: (2019)

Application of VCSEL in Bio-Sensing Atomic Magnetometers
por: Zhou, Peng, et al.
Publicado: (2022)

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition
por: Wang, Zi-Yi, et al.
Publicado: (2015)

Fabrication of low-temperature solid oxide fuel cells with a nanothin protective layer by atomic layer deposition
por: Ji, Sanghoon, et al.
Publicado: (2013)

Bi-layer Channel AZO/ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Technique
por: Li, Huijin, et al.
Publicado: (2017)

Enhanced performance of nitride-based ultraviolet vertical-injection light-emitting diodes by non-insulation current blocking layer and textured surface
por: Chiang, Yen Chih, et al.
Publicado: (2014)

Influence of argon plasma on the deposition of Al(2)O(3) film onto the PET surfaces by atomic layer deposition
por: Edy, Riyanto, et al.
Publicado: (2013)

The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin-Film Transistors Deposited via Atomic Layer Deposition
por: Ding, Xingwei, et al.
Publicado: (2017)

Improvement of carrier diffusion length in silicon nanowire arrays using atomic layer deposition
por: Kato, Shinya, et al.
Publicado: (2013)

Effects of doping and annealing on properties of ZnO films grown by atomic layer deposition
por: Wang, Aiji, et al.
Publicado: (2015)

Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
por: Huang, Ruomeng, et al.
Publicado: (2017)

Highly Sensitive and Stable SERS Substrate Fabricated by Co-sputtering and Atomic Layer Deposition
por: Yin, Guilin, et al.
Publicado: (2019)

Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition
por: Bang, Seokhwan, et al.
Publicado: (2012)

Thin film encapsulation for organic light-emitting diodes using inorganic/organic hybrid layers by atomic layer deposition
por: Zhang, Hao, et al.
Publicado: (2015)

Deposition of Silicon-Based Stacked Layers for Flexible Encapsulation of Organic Light Emitting Diodes
por: Hsu, Chia-Hsun, et al.
Publicado: (2019)

Effect of atomic layer deposition temperature on the performance of top-down ZnO nanowire transistors
por: Sultan, Suhana M, et al.
Publicado: (2014)

TiO(2) Nanomembranes Fabricated by Atomic Layer Deposition for Supercapacitor Electrode with Enhanced Capacitance
por: Naeem, Farah, et al.
Publicado: (2019)

Negative Differential Resistance Effect in Ru-Based RRAM Device Fabricated by Atomic Layer Deposition
por: Feng, Yulin, et al.
Publicado: (2019)

Solution-Processed Hybrid Light-Emitting Devices Comprising TiO(2) Nanorods and WO(3) Layers as Carrier-Transporting Layers
por: Tsai, Tsung-Yan, et al.
Publicado: (2016)

Impacts of Thermal Atomic Layer-Deposited AlN Passivation Layer on GaN-on-Si High Electron Mobility Transistors
por: Zhao, Sheng-Xun, et al.
Publicado: (2016)

Stepwise mechanism and H(2)O-assisted hydrolysis in atomic layer deposition of SiO(2) without a catalyst
por: Fang, Guo-Yong, et al.
Publicado: (2015)

Improved characteristics of near-band-edge and deep-level emissions from ZnO nanorod arrays by atomic-layer-deposited Al(2)O(3 )and ZnO shell layers
por: Sun, Wen-Cheng, et al.
Publicado: (2011)

Multi-Directional Growth of Aligned Carbon Nanotubes Over Catalyst Film Prepared by Atomic Layer Deposition
por: Zhou, Kai, et al.
Publicado: (2010)

Cannot write session to /tmp/vufind_sessions/sess_53d5f0gl0r7ajp5c2ju21g3c4e