Bayesian Machine Learning for Efficient Minimization of Defects in ALD Passivation Layers

[Image: see text] Atomic layer deposition (ALD) is an enabling technology for encapsulating sensitive materials owing to its high-quality, conformal coating capability. Finding the optimum deposition parameters is vital to achieving defect-free layers; however, the high dimensionality of the paramet...

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Detalles Bibliográficos
Autores principales: Dogan, Gül, Demir, Sinan O., Gutzler, Rico, Gruhn, Herbert, Dayan, Cem B., Sanli, Umut T., Silber, Christian, Culha, Utku, Sitti, Metin, Schütz, Gisela, Grévent, Corinne, Keskinbora, Kahraman
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8603353/
https://www.ncbi.nlm.nih.gov/pubmed/34735111
http://dx.doi.org/10.1021/acsami.1c14586

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8603353/
https://www.ncbi.nlm.nih.gov/pubmed/34735111
http://dx.doi.org/10.1021/acsami.1c14586

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