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Bayesian Machine Learning for Efficient Minimization of Defects in ALD Passivation Layers
[Image: see text] Atomic layer deposition (ALD) is an enabling technology for encapsulating sensitive materials owing to its high-quality, conformal coating capability. Finding the optimum deposition parameters is vital to achieving defect-free layers; however, the high dimensionality of the paramet...
Autores principales: | Dogan, Gül, Demir, Sinan O., Gutzler, Rico, Gruhn, Herbert, Dayan, Cem B., Sanli, Umut T., Silber, Christian, Culha, Utku, Sitti, Metin, Schütz, Gisela, Grévent, Corinne, Keskinbora, Kahraman |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2021
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8603353/ https://www.ncbi.nlm.nih.gov/pubmed/34735111 http://dx.doi.org/10.1021/acsami.1c14586 |
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