Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO(2) Studied by Gas-Phase Infrared and Optical Emission Spectroscopy

[Image: see text] An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO(2) using bisdiethylaminosilane (BDEAS, SiH(2)[NEt(2)](2)) and O(2) plasma is reported along with an investigation of its underlying growth mechanism. Within the temperature range of 1...

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Detalles Bibliográficos
Autores principales: Mione, M. A., Vandalon, V., Mameli, A., Kessels, W. M. M., Roozeboom, F.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8607820/
https://www.ncbi.nlm.nih.gov/pubmed/34824660
http://dx.doi.org/10.1021/acs.jpcc.1c07980

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8607820/
https://www.ncbi.nlm.nih.gov/pubmed/34824660
http://dx.doi.org/10.1021/acs.jpcc.1c07980

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