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Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si. Two main challenges exist with etching Si structures in the nanometer range with MACE: keeping mechanical...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8619014/ https://www.ncbi.nlm.nih.gov/pubmed/34835572 http://dx.doi.org/10.3390/nano11112806 |