Atomic Layer Deposition of Ultrathin ZnO Films for Hybrid Window Layers for Cu(In(x),Ga(1−x))Se(2) Solar Cells

The efficiency of thin-film chalcogenide solar cells is dependent on their window layer thickness. However, the application of an ultrathin window layer is difficult because of the limited capability of the deposition process. This paper reports the use of atomic layer deposition (ALD) processes for...

Descripción completa

Detalles Bibliográficos
Autores principales: Lee, Jaebaek, Jeon, Dong-Hwan, Hwang, Dae-Kue, Yang, Kee-Jeong, Kang, Jin-Kyu, Sung, Shi-Joon, Park, Hyunwoong, Kim, Dae-Hwan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8619686/
https://www.ncbi.nlm.nih.gov/pubmed/34835545
http://dx.doi.org/10.3390/nano11112779

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8619686/
https://www.ncbi.nlm.nih.gov/pubmed/34835545
http://dx.doi.org/10.3390/nano11112779

Ejemplares similares