Multilayer Reflective Coatings for BEUV Lithography: A Review

The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviol...

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Detalles Bibliográficos
Autores principales: Uzoma, Paul C., Shabbir, Salman, Hu, Huan, Okonkwo, Paul C., Penkov, Oleksiy V.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8620789/
https://www.ncbi.nlm.nih.gov/pubmed/34835544
http://dx.doi.org/10.3390/nano11112782

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8620789/
https://www.ncbi.nlm.nih.gov/pubmed/34835544
http://dx.doi.org/10.3390/nano11112782

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