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Multilayer Reflective Coatings for BEUV Lithography: A Review
The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviol...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8620789/ https://www.ncbi.nlm.nih.gov/pubmed/34835544 http://dx.doi.org/10.3390/nano11112782 |