Comparative Study on the Quality of Microcrystalline and Epitaxial Silicon Films Produced by PECVD Using Identical SiF(4) Based Process Conditions

Hydrogenated microcrystalline silicon (µc-Si:H) and epitaxial silicon (epi-Si) films have been produced from SiF(4), H(2) and Ar mixtures by plasma enhanced chemical vapor deposition (PECVD) at 200 °C. Here, both films were produced using identical deposition conditions, to determine if the conditio...

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Detalles Bibliográficos
Autores principales: Moreno, Mario, Ponce, Arturo, Galindo, Arturo, Ortega, Eduardo, Morales, Alfredo, Flores, Javier, Ambrosio, Roberto, Torres, Alfonso, Hernandez, Luis, Vazquez-Leal, Hector, Patriarche, Gilles, Cabarrocas, Pere Roca i
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8621203/
https://www.ncbi.nlm.nih.gov/pubmed/34832349
http://dx.doi.org/10.3390/ma14226947

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8621203/
https://www.ncbi.nlm.nih.gov/pubmed/34832349
http://dx.doi.org/10.3390/ma14226947

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