Optimization of Sacrificial Layer Etching in Single-Crystal Silicon Nano-Films Transfer Printing for Heterogeneous Integration Application

As one of the important technologies in the field of heterogeneous integration, transfer technology has broad application prospects and unique technical advantages. This transfer technology includes the wet chemical etching of a sacrificial layer, such that silicon nano-film devices are released fro...

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Detalles Bibliográficos
Autores principales: Zhang, Jiaqi, Wu, Yichang, Yang, Guofang, Chen, Dazheng, Zhang, Jincheng, You, Hailong, Zhang, Chunfu, Hao, Yue
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8622541/
https://www.ncbi.nlm.nih.gov/pubmed/34835848
http://dx.doi.org/10.3390/nano11113085

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8622541/
https://www.ncbi.nlm.nih.gov/pubmed/34835848
http://dx.doi.org/10.3390/nano11113085

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