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A Novel Nitrogen Ion Implantation Technique for Turning Thin Film “Normally On” AlGaN/GaN Transistor into “Normally Off” Using TCAD Simulation
This study presents an innovative, low-cost, mass-manufacturable ion implantation technique for converting thin film normally on AlGaN/GaN devices into normally off ones. Through TCAD (Technology Computer-Aided Design) simulations, we converted a calibrated normally on transistor into a normally off...
Autores principales: | Sheu, Gene, Song, Yu-Lin, Susmitha, Dupati, Issac, Kutagulla, Mogarala, Ramyasri |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8623484/ https://www.ncbi.nlm.nih.gov/pubmed/34832128 http://dx.doi.org/10.3390/membranes11110899 |
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