Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale

This paper presents a new approach for material removal on silicon at atomic and close-to-atomic scale assisted by photons. The corresponding mechanisms are also investigated. The proposed approach consists of two sequential steps: surface modification and photon irradiation. The back bonds of silic...

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Detalles Bibliográficos
Autores principales: Wang, Peizhi, Wang, Jinshi, Fang, Fengzhou
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Singapore 2021
Materias:
Original Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8679649/
https://www.ncbi.nlm.nih.gov/pubmed/34993418
http://dx.doi.org/10.1007/s41871-021-00116-4

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8679649/
https://www.ncbi.nlm.nih.gov/pubmed/34993418
http://dx.doi.org/10.1007/s41871-021-00116-4

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