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Removal of Ag remanence and improvement in structural attributes of silicon nanowires array via sintering

Metal-assisted chemical etching (MACE) is popular due to the large-area fabrication of silicon nanowires (SiNWs) exhibiting a high aspect ratio at a low cost. The remanence of metal, i.e., silver nanoparticles (AgNPs) used in the MACE, deteriorates the device (especially solar cell) performance by a...

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Detalles Bibliográficos
Autores principales: Kale, Paresh, Sahoo, Mihir Kumar
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8683431/
https://www.ncbi.nlm.nih.gov/pubmed/34921206
http://dx.doi.org/10.1038/s41598-021-03654-5