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Removal of Ag remanence and improvement in structural attributes of silicon nanowires array via sintering
Metal-assisted chemical etching (MACE) is popular due to the large-area fabrication of silicon nanowires (SiNWs) exhibiting a high aspect ratio at a low cost. The remanence of metal, i.e., silver nanoparticles (AgNPs) used in the MACE, deteriorates the device (especially solar cell) performance by a...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Nature Publishing Group UK
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8683431/ https://www.ncbi.nlm.nih.gov/pubmed/34921206 http://dx.doi.org/10.1038/s41598-021-03654-5 |