Using Modified-Intake Plasma-Enhanced Metal–Organic Chemical Vapor Deposition System to Grow Gallium Doped Zinc Oxide

We have used a modified-intake plasma-enhanced metal–organic chemical vapor deposition (MIPEMOCVD) system to fabricate gallium-doped zinc oxide (GZO) thin films with varied Ga content. The MIPEMOCVD system contains a modified intake system of a mixed tank and a spraying terminal to deliver the metal...

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Detalles Bibliográficos
Autores principales: Lei, Po-Hsun, Chen, Jia-Jan, Song, Ming-Hsiu, Zhan, Yuan-Yu, Jiang, Zong-Lin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8703904/
https://www.ncbi.nlm.nih.gov/pubmed/34945439
http://dx.doi.org/10.3390/mi12121590

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8703904/
https://www.ncbi.nlm.nih.gov/pubmed/34945439
http://dx.doi.org/10.3390/mi12121590

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