Interface Optimization and Transport Modulation of Sm(2)O(3)/InP Metal Oxide Semiconductor Capacitors with Atomic Layer Deposition-Derived Laminated Interlayer

In this paper, the effect of atomic layer deposition-derived laminated interlayer on the interface chemistry and transport characteristics of sputtering-deposited Sm(2)O(3)/InP gate stacks have been investigated systematically. Based on X-ray photoelectron spectroscopy (XPS) measurements, it can be...

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Detalles Bibliográficos
Autores principales: Lu, Jinyu, He, Gang, Yan, Jin, Dai, Zhenxiang, Zheng, Ganhong, Jiang, Shanshan, Qiao, Lesheng, Gao, Qian, Fang, Zebo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8705081/
https://www.ncbi.nlm.nih.gov/pubmed/34947792
http://dx.doi.org/10.3390/nano11123443

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8705081/
https://www.ncbi.nlm.nih.gov/pubmed/34947792
http://dx.doi.org/10.3390/nano11123443

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