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Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
Group-IV alloy GeSn holds great promise for the high-performance optoelectronic devices that can be monolithically integrated on Si for near- and mid-infrared applications. Growth of GeSn using chemical vapor deposition technique with various Sn and Ge precursors has been investigated worldwide. To...
Autores principales: | Grant, Joshua, Abernathy, Grey, Olorunsola, Oluwatobi, Ojo, Solomon, Amoah, Sylvester, Wanglia, Emmanuel, Saha, Samir K., Sabbar, Abbas, Du, Wei, Alher, Murtadha, Li, Bao-Hua, Yu, Shui-Qing |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8705099/ https://www.ncbi.nlm.nih.gov/pubmed/34947234 http://dx.doi.org/10.3390/ma14247637 |
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