Cargando…
Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process
Transparent electrodes are a core component for transparent electron devices, photoelectric devices, and advanced displays. In this work, we fabricate fully-transparent, highly-conductive Al-doped ZnO (AZO) films using an atomic layer deposition (ALD) system method of repeatedly stacking ZnO and Al(...
Autores principales: | , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8746340/ https://www.ncbi.nlm.nih.gov/pubmed/35010122 http://dx.doi.org/10.3390/nano12010172 |
_version_ | 1784630561813299200 |
---|---|
author | Zhao, Kai Xie, Jingye Zhao, Yudi Han, Dedong Wang, Yi Liu, Bin Dong, Junchen |
author_facet | Zhao, Kai Xie, Jingye Zhao, Yudi Han, Dedong Wang, Yi Liu, Bin Dong, Junchen |
author_sort | Zhao, Kai |
collection | PubMed |
description | Transparent electrodes are a core component for transparent electron devices, photoelectric devices, and advanced displays. In this work, we fabricate fully-transparent, highly-conductive Al-doped ZnO (AZO) films using an atomic layer deposition (ALD) system method of repeatedly stacking ZnO and Al(2)O(3) layers. The influences of Al cycle ratio (0, 2, 3, and 4%) on optical property, conductivity, crystallinity, surface morphology, and material components of the AZO films are examined, and current conduction mechanisms of the AZO films are analyzed. We found that Al doping increases electron concentration and optical bandgap width, allowing the AZO films to excellently combine low resistivity with high transmittance. Besides, Al doping induces preferred-growth-orientation transition from (002) to (100), which improves surface property and enhances current conduction across the AZO films. Interestingly, the AZO films with an Al cycle ratio of 3% show preferable film properties. Transparent ZnO thin film transistors (TFTs) with AZO electrodes are fabricated, and the ZnO TFTs exhibit superior transparency and high performance. This work accelerates the practical application of the ALD process in fabricating transparent electrodes. |
format | Online Article Text |
id | pubmed-8746340 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-87463402022-01-11 Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process Zhao, Kai Xie, Jingye Zhao, Yudi Han, Dedong Wang, Yi Liu, Bin Dong, Junchen Nanomaterials (Basel) Article Transparent electrodes are a core component for transparent electron devices, photoelectric devices, and advanced displays. In this work, we fabricate fully-transparent, highly-conductive Al-doped ZnO (AZO) films using an atomic layer deposition (ALD) system method of repeatedly stacking ZnO and Al(2)O(3) layers. The influences of Al cycle ratio (0, 2, 3, and 4%) on optical property, conductivity, crystallinity, surface morphology, and material components of the AZO films are examined, and current conduction mechanisms of the AZO films are analyzed. We found that Al doping increases electron concentration and optical bandgap width, allowing the AZO films to excellently combine low resistivity with high transmittance. Besides, Al doping induces preferred-growth-orientation transition from (002) to (100), which improves surface property and enhances current conduction across the AZO films. Interestingly, the AZO films with an Al cycle ratio of 3% show preferable film properties. Transparent ZnO thin film transistors (TFTs) with AZO electrodes are fabricated, and the ZnO TFTs exhibit superior transparency and high performance. This work accelerates the practical application of the ALD process in fabricating transparent electrodes. MDPI 2022-01-05 /pmc/articles/PMC8746340/ /pubmed/35010122 http://dx.doi.org/10.3390/nano12010172 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Zhao, Kai Xie, Jingye Zhao, Yudi Han, Dedong Wang, Yi Liu, Bin Dong, Junchen Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process |
title | Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process |
title_full | Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process |
title_fullStr | Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process |
title_full_unstemmed | Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process |
title_short | Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process |
title_sort | investigation on transparent, conductive zno:al films deposited by atomic layer deposition process |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8746340/ https://www.ncbi.nlm.nih.gov/pubmed/35010122 http://dx.doi.org/10.3390/nano12010172 |
work_keys_str_mv | AT zhaokai investigationontransparentconductiveznoalfilmsdepositedbyatomiclayerdepositionprocess AT xiejingye investigationontransparentconductiveznoalfilmsdepositedbyatomiclayerdepositionprocess AT zhaoyudi investigationontransparentconductiveznoalfilmsdepositedbyatomiclayerdepositionprocess AT handedong investigationontransparentconductiveznoalfilmsdepositedbyatomiclayerdepositionprocess AT wangyi investigationontransparentconductiveznoalfilmsdepositedbyatomiclayerdepositionprocess AT liubin investigationontransparentconductiveznoalfilmsdepositedbyatomiclayerdepositionprocess AT dongjunchen investigationontransparentconductiveznoalfilmsdepositedbyatomiclayerdepositionprocess |