Mapping Oxidation and Wafer Cleaning to Device Characteristics Using Physics-Assisted Machine Learning

[Image: see text] It is always highly desired to have a well-defined relationship between the chemistry in semiconductor processing and the device characteristics. With the shrinkage of technology nodes in the semiconductors roadmap, it becomes more complicated to understand the relation between the...

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Detalles Bibliográficos
Autores principales: Pratik, Sparsh, Liu, Po-Ning, Ota, Jun, Tu, Yen-Liang, Lai, Guan-Wen, Ho, Ya-Wen, Yang, Zheng-Kai, Rawat, Tejender Singh, Lin, Albert S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8756782/
https://www.ncbi.nlm.nih.gov/pubmed/35036757
http://dx.doi.org/10.1021/acsomega.1c05552

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8756782/
https://www.ncbi.nlm.nih.gov/pubmed/35036757
http://dx.doi.org/10.1021/acsomega.1c05552

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