Comparison of Plasma Deposition of Carbon Nanomaterials Using Various Polymer Materials as a Carbon Atom Source

Carbon nanowalls are promising materials for various electrochemical devices due to their chemical inertness, desirable electrical conductivity, and excellent surface-to-mass ratio. Standard techniques, often based on plasma-assisted deposition using gaseous precursors, enable the synthesis of top-q...

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Detalles Bibliográficos
Autores principales: Vesel, Alenka, Zaplotnik, Rok, Primc, Gregor, Paul, Domen, Mozetič, Miran
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8778974/
https://www.ncbi.nlm.nih.gov/pubmed/35055262
http://dx.doi.org/10.3390/nano12020246

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8778974/
https://www.ncbi.nlm.nih.gov/pubmed/35055262
http://dx.doi.org/10.3390/nano12020246

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