Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film

In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature...

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Detalles Bibliográficos
Autores principales: Bronicki, Jakub, Grochala, Dominik, Rydosz, Artur
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Brief Report
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8779826/
https://www.ncbi.nlm.nih.gov/pubmed/35062612
http://dx.doi.org/10.3390/s22020651

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8779826/
https://www.ncbi.nlm.nih.gov/pubmed/35062612
http://dx.doi.org/10.3390/s22020651

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