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Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film
In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8779826/ https://www.ncbi.nlm.nih.gov/pubmed/35062612 http://dx.doi.org/10.3390/s22020651 |