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Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant
Acoustic cavitation is used for megasonic cleaning in the semiconductor industry, especially of wafers with fragile pattern structures. Control of transient cavitation is necessary to achieve high particle removal efficiency (PRE) and low pattern damage (PD). In this study, the cleaning performance...
Autores principales: | Sahoo, Bichitra Nanda, Han, So Young, Kim, Hyun-Tae, Ando, Keita, Kim, Tae-Gon, Kang, Bong-Kyun, Klipp, Andreas, Yerriboina, Nagendra Prasad, Park, Jin-Goo |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Elsevier
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8799594/ https://www.ncbi.nlm.nih.gov/pubmed/34969001 http://dx.doi.org/10.1016/j.ultsonch.2021.105859 |
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