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Nanostructured Ge and GeSn films by high-pressure He plasma sputtering for high-capacity Li ion battery anodes
We fabricated nanostructured Ge and GeSn films using He radio-frequency magnetron plasma sputtering deposition. Monodisperse amorphous Ge and GeSn nanoparticles of 30–40 nm size were arranged without aggregation by off-axis sputtering deposition in the high He-gas-pressure range of 0.1 Torr. The Ge...
Autores principales: | , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8810848/ https://www.ncbi.nlm.nih.gov/pubmed/35110578 http://dx.doi.org/10.1038/s41598-022-05579-z |