Nanostructured Ge and GeSn films by high-pressure He plasma sputtering for high-capacity Li ion battery anodes

We fabricated nanostructured Ge and GeSn films using He radio-frequency magnetron plasma sputtering deposition. Monodisperse amorphous Ge and GeSn nanoparticles of 30–40 nm size were arranged without aggregation by off-axis sputtering deposition in the high He-gas-pressure range of 0.1 Torr. The Ge...

Descripción completa

Detalles Bibliográficos
Autores principales: Uchida, Giichiro, Nagai, Kenta, Habu, Yuma, Hayashi, Junki, Ikebe, Yumiko, Hiramatsu, Mineo, Narishige, Ryota, Itagaki, Naho, Shiratani, Masaharu, Setsuhara, Yuichi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8810848/
https://www.ncbi.nlm.nih.gov/pubmed/35110578
http://dx.doi.org/10.1038/s41598-022-05579-z

Ejemplares similares

Ejemplares similares