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Revealing the Chemical Reaction Properties of a SiHCl(3) Pyrolysis System by the ReaxFF Molecular Dynamics Method
[Image: see text] The pyrolysis kinetics of SiHCl(3) and its reaction mechanism are essential for the chemical vapor deposition process in polysilicon industries. However, due to the high temperature and lack of in situ experimental detection technology, it is difficult to carry out experimental res...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2022
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8829944/ https://www.ncbi.nlm.nih.gov/pubmed/35155887 http://dx.doi.org/10.1021/acsomega.1c03998 |